Cov tshuaj chlorine residual (feem ntau yog hypochlorous acid HOCl thiab hypochlorite OCl⁻) muaj zog oxidizing thiab puas tsuaj rau ion pauv resins. Qhov kev puas tsuaj no yog cov txheej txheem tshuaj degradation uas ua rau cov resin lub neej luv luv thiab txo nws cov peev xwm pauv.
Lub hauv paus ntawm ion txauv resin yog nws tus ntoo khaub lig-linked polymer qaum. Residual chlorine, raws li ib tug muaj zog oxidant, tawm tsam benzene nplhaib qauv, rhuav tshem nws aromaticity. Qhov hnyav dua, nws oxidizes thiab rhuav tshem cov pa roj carbon -carbon bonds txuas cov polymer chains thiab bridging bonds ntawm tus ntoo khaub lig-linking agent, divinylbenzene.
Rau cov pab pawg ua haujlwm xws li sulfonic acid pawg, oxidative degradation ntawm cov pob txha los ntawm cov tshuaj chlorine seem tsis muaj zog ua rau cov ntsiab lus txuas ntawm sulfonic acid pawg, thaum kawg ua rau cov detachment ntawm sulfonic acid pawg thiab tsis muaj peev xwm pauv.
Oxidation ntawm cov resin los ntawm residual chlorine ua rau ib tug mus tas li poob ntawm kev sib pauv peev. Cov pab pawg ua haujlwm puas tsis tuaj yeem rov tsim dua tshiab, ua rau txo qis kev kho mob; Lub voj voog ua haujlwm luv luv yuav tsum muaj kev tsim dua tshiab, ua kom cov nqi khiav lag luam (regenerant, dej siv, sijhawm); thiab resin breakage, raws li cov oxidative degradation ntawm lub caj qaum ua rau txo resin zog, ua rau nws nkig thiab tawg. Cov khib nyiab tsub kom lub cev poob siab, txhaws cov dej xa dej, thiab ua rau cov dej ntws tawm; organic teeb meem dissolves, thiab degradation cov khoom (xws li tsis tshua muaj molecular hnyav organic acids thiab amines) leach los ntawm resin, polluting cov dej kho.
Yuav ua li cas tshem tawm cov chlorine residual?
Cov txheej txheem tshem tawm cov tshuaj chlorine seem yuav tsum ua kom zoo, txhim khu kev qha, thiab kev lag luam. Cov txheej txheem tseem ceeb yog raws li nram no:
1. Ua kom cov pa roj carbon adsorption
Ib lub qhov dej-tsim tsim cov pa roj carbon monoxide (lub sijhawm sib cuag lub txaj EBCT feem ntau yog 5-15 feeb) tuaj yeem txo qis cov tshuaj chlorine uas seem ntawm 1-2 mg/L rau <0.01 mg/L.
Lub peev xwm adsorption ntawm activated carbon rau residual chlorine yog feem ntau nyob rau hauv thaj tsam ntawm 0.1-1.0 gCl₂ / g activated carbon, nyob ntawm seb hom carbon, dej zoo, thiab kev khiav hauj lwm tej yam kev mob. Qhov no txhais tau hais tias ib kilogram ntawm cov pa roj carbon activated tuaj yeem kho ntau pua mus rau txhiab litres ntawm cov dej chlorinated (raws li cov tshuaj chlorine seem ntawm 1 mg / L).
Cov pa roj carbon activated muaj thaj tsam loj tshwj xeeb (feem ntau 800-1500 m² / g) thiab cov qauv tsim microporous zoo, ua kom nws tshem tawm cov tshuaj chlorine zoo los ntawm lub cev adsorption thiab tshuaj txo qis (txo qhov chaw ntawm cov pa roj carbon activated txo HOCl/OCl⁻).
Advantages: High removal efficiency (typically >99%), muaj peev xwm ntawm ib txhij tshem tawm cov organic teeb meem, tsw, xim, thiab lwm yam kuab paug los ntawm dej. Kev ua haujlwm yooj yim thiab kev saib xyuas yooj yim (tsis tu ncua rov qab, hloov tom qab saturation).
2. Tshuaj txo tus neeg saib xyuas noj:
Raws li txoj cai, tshem tawm 1 mg / L ntawm cov tshuaj chlorine residual (Cl₂) yuav tsum muaj kwv yees li 1.46 mg / L ntawm NaHSO₃ (los yog kwv yees li 1.34 mg / L ntawm SO₂). Hauv kev siv tswv yim, xav txog qhov tsis ua tiav cov tshuaj tiv thaiv thiab ua kom muaj kev nyab xeeb, qhov sib piv ntau npaum li cas yog 1.8: 1 txog 3: 1 (mg NaHSO₃ : mgCl₂).
Kev saib xyuas cov tshuaj chlorine hauv online kom meej thiab ntsuas cov twj tso kua mis yuav tsum tau kaw - lub voj voog tswj kom tsis txhob muaj qhov tsis txaus (uas ua rau cov resin puas) los yog overdosing (uas ua rau cov khoom pov tseg thiab yuav qhia tau cov ions ntxiv xws li SO₄²⁻).
Qhov zoo: Cov tshuaj tiv thaiv ceev heev (thib ob), kev tswj kev siv tshuaj ntau, cov hneev taw me me, haum rau kev tuav cov nqi ntws loj lossis cov xwm txheej uas muaj qhov hloov pauv loj hauv cov tshuaj chlorine seem.
3. Ultraviolet (UV) irradiation (tseem siv tsawg): Cov wavelengths tshwj xeeb ntawm UV teeb (tsuas yog 254nm) tuaj yeem photolyze residual chlorine. Txawm li cas los xij, nws qhov kev ua tau zoo kuj tsis tshua muaj (yuav tsum tau siv ntau dua), tus nqi siab, thiab nws muaj qhov yuav tsum tau hais txog dej turbidity thiab lub teeb kis. Nws feem ntau tsis yog siv los ua ib txoj hauv kev tseem ceeb rau kev tiv thaiv resin thiab tshem tawm cov tshuaj chlorination, tab sis yog siv tshuaj tua kab mob lossis ua ib txoj hauv kev pab.